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Industrial Utilization of Capacitive Deionization Technology for the Removal of Fluoride and Toxic Metal Ions (As3+/5+ and Pb2+), Global Challenges, 2022, 2100129. (DOI: 10.1002/gch2.202100129)
, , , ,Islam, M. R., Gupta, S. S., Jana, S. K., Pradeep, T., Industrial Utilization of Capacitive Deionization Technology for the Removal of Fluoride and Toxic Metal Ions (As3+/5+ and Pb2+), Global Challenges, 2022, 2100129. (DOI: 10.1002/gch2.202100129)
HSB 148, DST Unit of Nanoscience, Indian Institute of Technology, Madras, Chennai-600036, India.